{"id":6944,"date":"2026-08-05T15:30:08","date_gmt":"2026-08-05T06:30:08","guid":{"rendered":"https:\/\/www.itohpat.co.jp\/?post_type=ip&#038;p=6944"},"modified":"2026-08-05T15:30:08","modified_gmt":"2026-08-05T06:30:08","slug":"6944","status":"publish","type":"ip","link":"https:\/\/www.itohpat.co.jp\/en\/ip\/6944\/","title":{"rendered":"JPO Annual Report 2026: Designs and Trademarks"},"content":{"rendered":"<p>The Japan Patent Office has recently published its \u201cAnnual Report 2026.\u201d We are pleased to provide below a summary of the main points relating to designs and trademarks.<\/p>\r\n<p><span style=\"color: #0000ff;\"><strong>Designs<\/strong><\/span><\/p>\r\n<p><strong>1. Trends in Design Registration Applications<\/strong><br \/>\r\n<strong>(1) Trends in the Number of Design Registration Applications<\/strong><\/p>\r\n<p>The number of design registration applications has remained relatively stable although the proportion of international design registration applications has increased year by year.<\/p>\r\n<p>(Applications)<\/p>\r\n<p><img decoding=\"async\" loading=\"lazy\" src=\"https:\/\/www.itohpat.co.jp\/wordpress\/wp-content\/uploads\/2026\/08\/2026-08-05_1.png\" alt=\"\" \/><\/p>\r\n<p><img decoding=\"async\" loading=\"lazy\" src=\"https:\/\/www.itohpat.co.jp\/wordpress\/wp-content\/uploads\/2026\/08\/2026-08-05_2.png\" alt=\"\" \/> International Design Registration Applications<\/p>\r\n<p><img decoding=\"async\" loading=\"lazy\" src=\"https:\/\/www.itohpat.co.jp\/wordpress\/wp-content\/uploads\/2026\/08\/2026-08-05_3.png\" alt=\"\" \/>Design Registration Applications (Excluding International Design Registration Applications)<\/p>\r\n<p>&nbsp;<\/p>\r\n<p><strong>(2) Breakdown of Design Registration Applications (Domestic vs. Foreign Applicants)<\/strong><\/p>\r\n<p><br \/>\r\nLooking at the composition of applications, the number of applications filed by foreign applicants has increased steadily over the years. In 2025, foreign applicants accounted for just under 40% of all applications.<\/p>\r\n<p><img decoding=\"async\" loading=\"lazy\" src=\"https:\/\/www.itohpat.co.jp\/wordpress\/wp-content\/uploads\/2026\/08\/2026-08-05_4.png\" alt=\"\" \/><\/p>\r\n<p><strong>(3) <\/strong><strong>Trends in the Number of Applications by Field (Top 11 Classifications)<\/strong><\/p>\r\n<p>By field, the largest number of applications falls under <strong>F4 (Packaging Containers, etc.)<\/strong>, followed by <strong>G2 (Vehicles)<\/strong> and <strong>H7 (Electronic Information Input\/Output Equipment)<\/strong>.<\/p>\r\n<p>In addition, a relatively large number of applications have been filed in <strong>N3 (Image Designs)<\/strong>, which became eligible for protection in 2019, as well as in <strong>L3<\/strong>, which includes interior designs for buildings.<a href=\"#_ftn1\" name=\"_ftnref1\"><span>[1]<\/span><\/a><\/p>\r\n<p><img decoding=\"async\" loading=\"lazy\" src=\"https:\/\/www.itohpat.co.jp\/wordpress\/wp-content\/uploads\/2026\/08\/2026-08-05_5.png\" alt=\"\" \/><\/p>\r\n<p><strong>(4) <\/strong><strong>Other Filing Trends<\/strong><\/p>\r\n<p>Divisional applications and multiple-design applications are used predominantly by foreign applicants. In 2025, foreign applicants accounted for more than 90% of the use of each of these filing systems.<\/p>\r\n<p><img decoding=\"async\" loading=\"lazy\" src=\"https:\/\/www.itohpat.co.jp\/wordpress\/wp-content\/uploads\/2026\/08\/2026-08-05_6.png\" alt=\"\" \/><\/p>\r\n<p>&nbsp;<\/p>\r\n<p><strong>(5) <\/strong><strong>Trends in the Time to Registration and the Average First Action (FA) Period<\/strong><\/p>\r\n<p>Both the average time required to obtain design registration and the average First Action (FA) period have gradually shortened in recent years.<\/p>\r\n<p><img decoding=\"async\" loading=\"lazy\" src=\"https:\/\/www.itohpat.co.jp\/wordpress\/wp-content\/uploads\/2026\/08\/2026-08-05_7.png\" alt=\"\" \/><\/p>\r\n<p>&nbsp;<\/p>\r\n<p><strong>(6) <\/strong><strong>Trends in Design Registration Applications Filed in Japan by Foreign Applicants<\/strong><\/p>\r\n<p><strong>\u00a0<\/strong>In recent years, the number of applications filed by applicants from Europe, the United States, and Korea has remained generally stable although the number of applications from China has increased continuously.<\/p>\r\n<p><img decoding=\"async\" loading=\"lazy\" src=\"https:\/\/www.itohpat.co.jp\/wordpress\/wp-content\/uploads\/2026\/08\/2026-08-05_8.png\" alt=\"\" \/><\/p>\r\n<p>Meanwhile, the number of design applications filed in China by domestic applicants declined in 2025, suggesting that some Chinese applicants regard the Japanese market as an attractive destination for design protection.<\/p>\r\n<p><strong>For reference: <\/strong><strong>Trends in the Number of Design Registration Applications Filed with Major Countries and Offices<\/strong><\/p>\r\n<p><img decoding=\"async\" loading=\"lazy\" src=\"https:\/\/www.itohpat.co.jp\/wordpress\/wp-content\/uploads\/2026\/08\/2026-08-05_9.png\" alt=\"\" \/><\/p>\r\n<p>&nbsp;<\/p>\r\n<p><strong>2. Registration Status<\/strong><\/p>\r\n<p><strong>(1) Trends in the Numbers of Applications and Registrations<\/strong><\/p>\r\n<p>The registration rate for design applications has remained at a level close to 90%.<\/p>\r\n<p><img decoding=\"async\" loading=\"lazy\" src=\"https:\/\/www.itohpat.co.jp\/wordpress\/wp-content\/uploads\/2026\/08\/2026-08-05_10.png\" alt=\"\" \/><\/p>\r\n<p><strong>(2) Trends in Requests for Appeal Against an Examiner&#8217;s Decision of Refusal and Successful Appeals<\/strong><\/p>\r\n<p>In recent years, the success rate of appeals against an examiner&#8217;s decision of refusal has been approximately 70% to 75%.<\/p>\r\n<p><img decoding=\"async\" loading=\"lazy\" src=\"https:\/\/www.itohpat.co.jp\/wordpress\/wp-content\/uploads\/2026\/08\/2026-08-05_11.png\" alt=\"\" \/><\/p>\r\n<p>&nbsp;<\/p>\r\n<p><span style=\"color: #0000ff;\"><strong>Trademarks<\/strong><\/span><\/p>\r\n<p><strong>1. Trends in Trademark Registration Applications<\/strong><\/p>\r\n<p><strong>(1) Trends in the Number of Trademark Registration Applications<\/strong><\/p>\r\n<p>From 2021 to 2024, the number of trademark applications was on a downward trend. However, in 2025, the number of applications increased for the first time in several years. The number of international trademark applications under the Madrid Protocol remained generally stable.<\/p>\r\n<p><img decoding=\"async\" loading=\"lazy\" src=\"https:\/\/www.itohpat.co.jp\/wordpress\/wp-content\/uploads\/2026\/08\/2026-08-05_12.png\" alt=\"\" \/><\/p>\r\n<p><strong>For reference: Key Points for Filing Trademark Applications in Japan<\/strong><\/p>\r\n<p><span style=\"text-decoration: underline;\"><a href=\"https:\/\/www.itohpat.co.jp\/en\/ip\/6716\/\">https:\/\/www.itohpat.co.jp\/en\/ip\/6716\/<\/a><\/span><\/p>\r\n<p>&nbsp;<\/p>\r\n<p><strong>(2) Breakdown of Trademark Registration Applications (Domestic vs. Foreign Applicants)<\/strong><\/p>\r\n<p>Looking at the filing structure, it can be seen that applications from foreign applicants have been increasing year by year.<\/p>\r\n<p><img decoding=\"async\" loading=\"lazy\" src=\"https:\/\/www.itohpat.co.jp\/wordpress\/wp-content\/uploads\/2026\/08\/2026-08-05_13.png\" alt=\"\" \/><\/p>\r\n<p>&nbsp;<\/p>\r\n<p><strong>(3) Madrid Protocol Applications<\/strong><br \/>\r\n<br \/>\r\nThe graph below shows the trend in the number of Madrid Protocol applications filed with the Japan Patent Office as the Office of Origin.<br \/>\r\nAlthough both the number of applications and the number of designated countries declined in 2023, both have been on an upward trend since 2024. This indicates that the Madrid Protocol system has become established as a core tool for global brand protection.<\/p>\r\n<p><img decoding=\"async\" loading=\"lazy\" src=\"https:\/\/www.itohpat.co.jp\/wordpress\/wp-content\/uploads\/2026\/08\/2026-08-05_14.png\" alt=\"\" \/><\/p>\r\n<p><strong>For reference: Key Points for Designating Japan in a Madrid Protocol Trademark Application<\/strong><\/p>\r\n<p><span style=\"text-decoration: underline;\"><a href=\"https:\/\/www.itohpat.co.jp\/en\/ip\/5335\/\">https:\/\/www.itohpat.co.jp\/en\/ip\/5335\/<\/a><\/span><\/p>\r\n<p>&nbsp;<\/p>\r\n<p><strong>(4) Trends in the Time to Registration and the Average First Action (FA) Period<\/strong><\/p>\r\n<p>Both the average total pendency period until trademark registration and the average first action pendency period have been gradually shortened.<\/p>\r\n<p><img decoding=\"async\" loading=\"lazy\" src=\"https:\/\/www.itohpat.co.jp\/wordpress\/wp-content\/uploads\/2026\/08\/2026-08-05_15.png\" alt=\"\" \/><\/p>\r\n<p>&nbsp;<\/p>\r\n<p><strong>(5) Trends in Trademark Registration Applications Filed in Japan by Foreign Applicants<\/strong><\/p>\r\n<p>In recent years, the number of applications from Europe, the United States, and South Korea has remained generally stable although the number of applications from China has increased.<\/p>\r\n<p><img decoding=\"async\" loading=\"lazy\" src=\"https:\/\/www.itohpat.co.jp\/wordpress\/wp-content\/uploads\/2026\/08\/2026-08-05_16.png\" alt=\"\" \/><\/p>\r\n<p>On the other hand, the number of Chinese domestic applications decreased in 2024, from 7,188,336 in 2023 to 6,970,559 in 2024 on a class-count basis. This suggests that Japan continues to be an important market for Chinese applicants.<\/p>\r\n<p>&nbsp;<\/p>\r\n<p><strong>For reference: Trends in the Number of Trademark Registration Applications Filed with Major Countries and Offices <\/strong><a href=\"#_ftn2\" name=\"_ftnref2\"><span>[2]<\/span><\/a><\/p>\r\n<p><img decoding=\"async\" loading=\"lazy\" src=\"https:\/\/www.itohpat.co.jp\/wordpress\/wp-content\/uploads\/2026\/08\/2026-08-05_17.png\" alt=\"\" \/><\/p>\r\n<p><strong>2. Registration Status<\/strong><\/p>\r\n<p><strong>(1) Number of Trademark Applications Allowed for Registration<\/strong><\/p>\r\n<p>While the number of applications increased from 2024 to 2025, the number of applications allowed for registration remained generally flat. Various factors may underlie this trend, but one possible factor is that examination by the JPO, particularly examination concerning distinctiveness, has become stricter than before.<br \/>\r\nThe allowance rate was 88.4% in 2024 and 87.5% in 2025.<\/p>\r\n<p><img decoding=\"async\" loading=\"lazy\" src=\"https:\/\/www.itohpat.co.jp\/wordpress\/wp-content\/uploads\/2026\/08\/2026-08-05_18.png\" alt=\"\" \/><\/p>\r\n<p><strong>For reference: Trends in Distinctiveness Determinations in Japan<\/strong><\/p>\r\n<p><span style=\"text-decoration: underline;\"><a href=\"https:\/\/www.itohpat.co.jp\/en\/ip\/3616\/\">https:\/\/www.itohpat.co.jp\/en\/ip\/3616\/<\/a><\/span><\/p>\r\n<p>&nbsp;<\/p>\r\n<p><strong>(2) Number of Cancellation Trial Requests<\/strong><\/p>\r\n<p>The number of requests for cancellation trials, including non-use cancellation trials, has remained generally flat.<br \/>\r\nFiling a non-use cancellation trial against a cited mark in an Office Action has long been, and continues to be, a commonly used measure.<\/p>\r\n<p><img decoding=\"async\" loading=\"lazy\" src=\"https:\/\/www.itohpat.co.jp\/wordpress\/wp-content\/uploads\/2026\/08\/2026-08-05_19.png\" alt=\"\" \/><\/p>\r\n<p>&nbsp;<\/p>\r\n<p>&nbsp;<\/p>\r\n<p><a href=\"#_ftnref1\" name=\"_ftn1\"><span>[1]<\/span><\/a> Alphabetic code(s) followed by number(s) indicate the Japanese Design Classification.<\/p>\r\n<p><a href=\"#_ftnref2\" name=\"_ftn2\"><span>[2]<\/span><\/a> The figures for China are shown on the right-hand axis. Since China does not publish figures based on the number of applications, the figures shown represent the number of classes designated in the applications.<\/p>\r\n<p>&nbsp;<\/p>","protected":false},"excerpt":{"rendered":"The Japan Patent Office has recently published its \u201cAnnual Report 2026.\u201d We are pleased to provide below a summary of the main points relating to designs and trademarks. Designs 1. Trends in Design Re\u2026","protected":false},"featured_media":0,"template":"","meta":{"_acf_changed":false,"footnotes":""},"ip_cat":[34],"class_list":["post-6944","ip","type-ip","status-publish","hentry","ip_cat-japanese-ip-system","en-US"],"acf":[],"_links":{"self":[{"href":"https:\/\/www.itohpat.co.jp\/wp-json\/wp\/v2\/ip\/6944","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.itohpat.co.jp\/wp-json\/wp\/v2\/ip"}],"about":[{"href":"https:\/\/www.itohpat.co.jp\/wp-json\/wp\/v2\/types\/ip"}],"version-history":[{"count":2,"href":"https:\/\/www.itohpat.co.jp\/wp-json\/wp\/v2\/ip\/6944\/revisions"}],"predecessor-version":[{"id":6987,"href":"https:\/\/www.itohpat.co.jp\/wp-json\/wp\/v2\/ip\/6944\/revisions\/6987"}],"wp:attachment":[{"href":"https:\/\/www.itohpat.co.jp\/wp-json\/wp\/v2\/media?parent=6944"}],"wp:term":[{"taxonomy":"ip_cat","embeddable":true,"href":"https:\/\/www.itohpat.co.jp\/wp-json\/wp\/v2\/ip_cat?post=6944"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}